International Symposium on Sputtering and
Plasma Processes (ISSP) was established in 1991. The main subject
of the 1st symposium was "Reactive Sputtering". Since
then, this symposium has been held every two years and the most current
topic concerning sputtering and plasma processes has been taken up as a
main subject at each symposium.
This symposium has two
characteristics. One characteristic is that the program committee members
are mainly researchers in industries. Hence, the general tendency of the
presented papers in the symposium is rather practical and industrial, though
very academic papers are also welcomed. The second is that all the
authors including invited speakers and oral presenters are requested to present
their papers at the Poster Session in the evening. This means that
the audiences can discuss the presented results with the authors in detail.
The 8th ISSP will be held on
June 8-10, 2005 in Kanazawa, Japan. I
hope that every engineer and researcher in the world who is interested in the
sputtering and plasma processes comes to Kanazawa and joins us to discuss the
central issues in the present materials science and technology.
OUTLINE OF SYMPOSIUM
Style of the Presentations:
Invited Presentation (talk and poster)
Presentation A (talk and poster)
Presentation B (poster only)
All oral presentation is also discussed in the poster session.
On-site Proceedings will be available at the symposium to better serve the
Special Issue of VACUUM:
Editor reviewed papers will be published in a special issue of VACUUM.
One "Best Poster Award" and 2
"Poster Award" will be given to the author(s) of the outstanding
poster presentations. Oral papers will be judged on their
poster presentations. The award ceremony will be held
at the last day of the symposium (June 10).
Hana Barankova (Uppsala Univ.)
Annemie Bogaerts (Univ. of Antwerp)
Gunter Brauer (FEP, IST)
Claes-Goran Granqvist (Uppsala Univ.)
Jeon Geon Han (Sungkyunkwan Univ.)
Cheng-Chung Lee (National Central Univ.)
Jae Koo Lee (Pohang Univ. of Science and Technology)
Arto Nurmikko (Brown Univ.)
Kouichi Ono (Kyoto Univ.)
Richard C. Ruby (Agilent Technologies)
Ichiro Takeuchi (Univ. of Maryland)
Hidekazu Tanaka (Osaka Univ.)
Beng Kang Tay (Nanyang Technological Univ.)
Hirotaka Toyoda (Nagoya Univ.)
Thomas Zettler (LayTec GmbH)
Applied Films Corp.
General Vacuum Equipment Ltd.
Huttinger Electronik GmbH+Co. KG
iplas innovative plasma systems gmbh
Lam Research Corp.
LEYBOLD OPTICS GmbH
MKS Instruments, Inc.
Physical Electronics USA, Inc.
Unaxis Balzers Ltd.
Veeco Instruments Inc.
The Vacuum Society of Japan
The Ceramic Society of Japan / The Institute of Electrical Engineers of Japan /
The Institute of Electronics, Information and Communication Engineers /
The Japan Society of Applied Physics / The Japan Vacuum Industry Association /
The Magnetics Society of Japan / The Materials Science Society of Japan /
The Society of Vacuum Coaters /
The Surface Finishing Society of Japan /
The Surface Science Society of Japan /
Akira Kinbara, The
University of Tokyo
Shigeru Baba, Seikei University
Gunter Brauer, FEP, IST
Joe Greene, University of Illinois
Jeon G. Han, Sungkyunkwan University
Tomonobu Hata, Kanazawa University
Yue Kuo, Texas A&M University
Retsu Oiwa, ULVAC-PHI, Inc.
Masatoshi Ono, The Vacuum Society of Japan
Eiji Setoyama, Hitachi High-Technologies Corp.
Yukio Yoshino, MURATA MFG. Co., Ltd.
Eiji Kusano, Kanazawa Inst. of Technol.
Shigeki Daikuhara, SHINCRON Co., Ltd.
Nobuo Fujiwara, Renesas Technology Corp.
Yasuhito Gotoh, Kyoto University
Toshitaka Kawashima, Sony Corp.
Naoto Kikuchi, National Institute of Advanced Industrial Science and Technology
Tsukasa Kobayashi, ANELVA Corp.
Kou Matsumoto, Nippon Sanso Co., Ltd.
Akira Mitsui, Asahi Glass Co., Ltd.
Kenzo Nagano, ULVAC, Inc.
Takeo Nakano, Seikei University
Yukio Ogino, The Vacuum Society of Japan
Hisashi Ohsaki, The University of Tokyo
Hideyuki Takahashi, Nikko Materials Co., Ltd.
Takao Tomioka, Central Glass Co. Ltd.
Tatsuro Usuki, Sanyo Electric Co., Ltd.
Local Arrangement Committee:
Eiji Kusano, Kanazawa Inst. of Technol.
Noriyuki Sakudo, Kanazawa Inst. of Technol.
Naoto Kikuchi, AIST
Hiroyuki Minami, Kanazawa Inst. of Technol.
Tetsuo Tsujii, Kanazawa Inst. of Technol.
Tomoyo Sakaeda, Kanazawa Inst. of Technol.
Eiji Kusano (ISSP2005 Committee)
Science Center, Kanazawa Institute of Technology
Phone: +81-76-274-9257, Fax: +81-76-274-9251