ISSP2005 Summary
ISSP2005 was successfully held from 8 June to 10 June 2005.
We, organizing committee, deeply appreciate to all the attendees
for interesting presentations and fruitful discussions.
We hope you enjoyed this symposium, and look forward to seeing
you again at the next meeting.
STATISTICS
Attendance
| Country |
Attendance |
| Japan |
212 |
| Belgium |
1 |
| Taiwan |
6 |
| Germany |
8 |
| Korea |
8 |
| Liechtenstein |
1 |
| Singapore |
1 |
| Sweden |
3 |
| UK |
3 |
| USA |
10 |
| Total |
253 |
Presentations
| |
Invited |
Contributed |
Total |
| Oral |
Poster |
| Opening |
2 |
0 |
0 |
2 |
| Thin Films |
4 |
13 |
25 |
42 |
| Fundamental of Sputtering and Plasma Processes |
2 |
2 |
5 |
9 |
| Sputtering Processes |
2 |
11 |
11 |
24 |
| Plasma Processes |
3 |
7 |
4 |
14 |
| Micro and Nano Technologies |
1 |
3 |
2 |
6 |
| Applications |
1 |
5 |
4 |
10 |
| Post Deadline Presentations |
0 |
2 |
11 |
13 |
| Total |
15 |
43 |
62 |
120 |
SELECTED PHOTOS
Please send questions, comments and suggestions via E-mail
to ISSP 2005 Committee, Vice Chair Eiji
Kusano.
Last modified June. 16, 2005