[Wednesday 8 June | Thursday 9 June | Friday 10 June]
| Room A | Room B | Room C | ||
| Welcome Address 10:00-10:20 |
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| Opening Session 10:20-11:40 |
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| Lunch Break 11:40-13:00 |
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| Thin Films I 13:00-14:40 |
Fundamentals of Sputtering and Plasma Processes 13:00-15:00 |
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| Coffee Break | ||||
| Thin Films II 15:00-17:20 (Incl. Post Deadline Paper) |
Coffee Break | |||
| Sputtering Processes I 15:20-17:20 (Incl. Post Deadline Paper) |
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| POSTER SESSION I 17:20-19:00 Posters from Oral Sessions Thin Films POSTER I Fundamentals of Sputtering and Plasma Processes POSTER Post Deadline Presentations POSTER I |
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| Room A | Room B | Room C | ||
| Thin Films III 9:40-11:40 |
Plasma Processes I 9:40-11:40 |
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| Lunch Break 11:40-13:00 |
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| Thin Films IV 13:00-15:00 |
Plasma Processes II 13:00-15:20 |
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| Coffee Break | ||||
| Micro and Nano Technologies 15:20-17:00 |
Coffee Break | |||
| Sputtering Processes II 15:40-17:00 |
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| POSTER SESSION II 17:00-19:00 Posters from Oral Sessions Micro and Nano Technologies POSTER Plasma Processes POSTER Post Deadline Presentations POSTER II |
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| Room A | Room B | Room C | ||
| Applications 9:40-12:00 |
Sputtering Processes III 9:40-12:00 (Incl. Post Deadline Paper) |
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| POSTER SESSION III 12:00-13:40 Posters from Oral Sessions Applications POSTER Thin Films POSTER II Post Deadline Presentations POSTER III |
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| Closing Remark 13:40-14:00 |
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