(back to issp archive main page)

4th: ISSP '97 (Kanazawa)

Outline

Date: 4-6 June, 1997
Venue: Kanazawa Institute of Technology, Ishikawa, Japan
Theme: Sputtering & Plasma Processes for Advanced Devices

Invited Speakers

G. A. Dixit (Texas Instruments, USA. )
T. Hata (Kanazawa University, JAPAN)
J. Jang (Kyung Hee University, KOREA.)
A. Kinbara (Kanazawa Institute of Technology, JAPAN)
Y. Kuo (IBM, USA)
Y. H. Lee (IBM, USA)
L. L. Lee (INTEVAC Inc., USA)
M. Naoe (Tokyo Institute of Technology, JAPAN. )
T. Ohta (NEC Corporation, , JAPAN. )
M. Saitoh (Hewlett-Packard Laboratories, JAPAN)
S. Sdhiller (FEP , GERMANY)
W. D. Sproul (North Western University, USA)
B. T. Sullivan (Institute for Microstructural Sciences, CANADA)
K. Tominaga (The University of Tokushima, JAPAN)
J. P. Zheng (AMSRL-SE-DC, USA)

Contact to: ISSP Webmaster (webmaster@issparchive.org)