[Wednesday 6 June | Thursday 7 June | Friday 8 June]
Room A | Room B | Room C | ||
Welcome Address 10:00-10:20 |
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Opening Session 10:20-11:40 |
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Lunch Break 11:40-13:00 |
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Micro and Nano Technologies 13:00-15:00 |
Sputtering Processes I 13:00-(14:40) |
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Coffee Break | ||||
Coffee Break | (SP I continued) 15:00-15:40 |
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Applications 15:20-17:00 |
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Fundamentals of Sputtering and Plasma Processes 15:40-17:00 |
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POSTER SESSION I 17:20-19:00 Posters from Oral Sessions Sputtering Processes: Poster Thin Films: Poster I Plasma Processes: Poster |
Room A | Room B | Room C | ||
Manufacturing Science and Technology I 9:40-11:40 |
Thin Films I 9:40-11:40 |
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Lunch Break 11:40-13:00 |
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Manufacturing Science and Technology II 13:00-15:00 |
Plasma Processes 13:00-14:40 |
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Coffee Break | ||||
Coffee Break | Thin Films II 15:00-17:00 |
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Manufacturing Science and Technology III 15:20-17:00 |
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POSTER SESSION II 17:20-19:00 Posters from Oral Sessions Applications: Poster Thin Films: Poster II Post-Deadline Presentations: Poster I |
Room A | Room B | Room C | ||
Thin Films III 9:40-11:40 |
Sputtering Processes II 9:40-11:40 |
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POSTER SESSION III 12:00-13:40 Posters from Oral Sessions Fundamentals of Sputtering and Plasma Processes: Poster Micro and Nano Technologies: Poster Thin Films: Poster III Post-Deadline Presentations: Poster II |
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Closing 13:40-14:00 |
Last Updated: 2007-03-02 |