ISSP2011: Symposium Summary
Statistics
Attendance
| Country | Attendance |
|---|---|
| Belgium | 2 |
| Czech Republic | 2 |
| Denmark | 1 |
| Germany | 6 |
| Korea | 9 |
| The Netherlands | 1 |
| Singapore | 1 |
| Sweden | 4 |
| Switzerland | 1 |
| Taiwan | 49 |
| UK | 1 |
| USA | 2 |
| Japan | 175 |
| Total | 254 |
Presentations
| Invited | Contributed | Total | ||
|---|---|---|---|---|
| Oral | Poster | |||
| Opening | 2 | 1 | 3 | |
| Fundamentals of Sputtering and Plasma Processes | 1 | 1 | 4 | 6 |
| Sputtering Processes | 3 | 10 | 10 | 23 |
| Plasma Processes | 1 | 5 | 10 | 16 |
| Plasma Induced Process Technologies | 0 | 0 | 4 | 4 |
| Thin Films | 3 | 9 | 54 | 66 |
| Micro and Nano Technologies | 0 | 0 | 10 | 10 |
| Applications | 0 | 3 | 17 | 20 |
| Total | 10 | 29 | 109 | 148 |
Selected Photos (click for large images)
Contact to: ISSP2011 Office (Contact Information)
| Last Updated: 2011-08-24 |
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