ISSP2015: Symposium Summary

Statistics

Attendance

CountryAttendance
Australia1
Austria1
Belgium1
Czech Republic2
France1
Germany7
Ireland3
Korea5
Lithuania1
Philippines3
Singapore1
Slovakia1
Slovenia1
Sweden1
Taiwan45
Tailand1
United Kingdom2
United States of America5
Japan131
Total213

Presentations

  Invited Contributed Total
Oral Poster
Opening 2     2
Fundamentals of Sputtering
and Plasma Processes
  4 5 9
Sputtering Processes   3 20 23
Plasma Processes 2 1 11 14
Plasma Induced
Process Technologies
  4 8 12
Thin Films 4 7 34 45
Micro and Nano Technologies   3 10 13
Applications 2 3 13 18
Others 1   1 2
Total 11 25 102 138

Selected Photos (click for large images)

Welcome Address by Prof. Kawakami (VSJ) Welcome Address by Dr. Kato (ISSP2015 chair) Keynote by Dr. Bräuer Invited lecture by Prof. Bilek Oral presentation Comments from the audience Coffee break Coffee break Koto performance Koto performance Poster room Poster room with Koto performance Poster discussion Poster discussion Award celemony (Ms. Suko) Award celemony (Ms. Ajia) Award celemony (Mr. Mian)


Contact to: ISSP2015 Office (Contact Information)